A Layout Planning System with Multiple Criteria and a Variable Domain Representation

This paper describes a new system capable of solving detailed facility layout problems. The system allows the consideration of multiple objectives on the layout solution. Criteria related to weighted distance between interacting layout elements, the structure of the final layout design, the use of circulation space in the layout and the satisfaction of special adjacency requirements, are included in the formulation. The paper includes a comparison of this new procedure to existing procedures using problems selected from the literature.

• 저널Management Science · 33(8) · 1020–1034
• 토픽Advanced Manufacturing and Logistics Optimization · Industrial and Manufacturing Engineering
• DOI10.1287/mnsc.33.8.1020
• 저자F. Robert Jacobs